Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming fin structure in fin field effect transistor process and fin structure

Method for forming fin structure in fin field effect transistor process and fin structure

US Patent 12224176 · Granted Feb 11, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dynamic illumination method based on scan exposure machine2022
High-bay light-emitting diode (LED) light fixture2021
High-bay light-emitting diode (LED) light fixture2021
Lighting fixtures having mounting structure openings and coverings2021
Method of forming patterned film on a bottom and a top-surface of a deep trench2015
Method of back-side patterning2014
Method of double-sided patterning2014
Method of manufacturing non-photosensitive polyimide passivation layer2013
System and method for simulating a transmission gate network and a bi-directiona2013
Roll profile for both shape control and free ruled rolling2011