Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optical proximity correction method and mask manufacturing method of lithography system

Optical proximity correction method and mask manufacturing method of lithography system

US Patent 12204241 · Granted Jan 21, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wooden structure building self-constructing method2025
Plasma processing apparatus and semiconductor fabrication method using the same2025
Hub device, multi-device system including the hub device and plurality of device2024
System and method for providing voice assistant service regarding text including2024
Memory device having sub wordline driver2024
Electronic apparatus and method for controlling electronic apparatus2024
Electronic devices and methods of controlling power in electronic devices2024
Lift apparatus and substrate processing apparatus including the same2024
Memory device including sub word line driving circuit2024
Mobile terminal with extendable display2024
Method and apparatus for identifying animal species2023
Sub word-line driver circuit of semiconductor memory device and semiconductor me2023