Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for modifying the strain state of a block of a semiconducting material

Method for modifying the strain state of a block of a semiconducting material

US Patent 12198940 · Granted Jan 14, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Coherent sampling true random number generation in FD-SOI technology2025
Method for manufacturing a SOI or SiGeOI type semiconductor-on-insulator substra2025
Semiconductor substrate polishing method2025
Semiconductor device and method for manufacturing a semiconductor device2025
Method for modifying a strain state of at least one semiconductor layer2024
Low-temperature method for transfer and healing of a semiconductor layer2024
Method for fabricating a doped region of a microelectronic device2024
Method for manufacturing a doped zone of a microelectronic device2024
Method of forming a porous portion in a substrate2024
RF substrate structure and method of production2023
Method of fabricating a semiconductor substrate having a stressed semiconductor 2023
Method of fabricating a semiconductor substrate having a stressed semiconductor 2023