Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reducing line-end space in integrated circuit patterning

Method for reducing line-end space in integrated circuit patterning

US Patent 12197131 · Granted Jan 14, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of manufacturing a semiconductor device and a semiconductor device2025
Method of manufacturing a semiconductor device and a semiconductor device2025
Semiconductor device and manufacturing method thereof2025
Semiconductor device and manufacturing method thereof2025
Device and method for high pressure anneal2024
Semiconductor device and method of forming same2024
Semiconductor processing tool and methods of operation2024
Etching apparatus and methods of cleaning thereof2024
Nitride-containing STI liner for SiGe channel2024
Nitride-containing STI liner for SiGe channel2024
Doping for semiconductor device with conductive feature2024
CMOS FinFET structures including work-function materials having different propor2024