Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of depositing epitaxial material, structure formed using the method, and system for performing the method

Method of depositing epitaxial material, structure formed using the method, and system for performing the method

US Patent 12173404 · Granted Dec 24, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Gas injection system and reactor system including same2025
Gas injection system and reactor system including same2025
Susceptors with film deposition control features2025
Susceptors with film deposition control features2025
Method and wafer processing furnace for forming an epitaxial stack on a pluralit2025
Film deposition systems and methods2024
Film deposition systems and methods2024
Methods for silicon germanium uniformity control using multiple precursors2024
Methods for silicon germanium uniformity control using multiple precursors2024
Methods of forming structures including silicon germanium and silicon layers, de2024
Methods of forming structures, semiconductor processing systems, and semiconduct2024
Methods of forming structures, semiconductor processing systems, and semiconduct2024