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Home › Method of using a dual stage lithographic apparatus and lithographic apparatus

Method of using a dual stage lithographic apparatus and lithographic apparatus

US Patent 12153354 · Granted Nov 26, 2024

Estimated economic value: $544,260,000 ⓘ

Assignee

Asml Netherlands B.V.

Inventors

Wouter Jan Cornelis Vijselaar (1 patents)
Hugo Thomas Looijestijn (3 patents)

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