Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate

Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate

US Patent 12148625 · Granted Nov 19, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wet etch process and methods to form air gaps between metal interconnects2025
Wet etch process and methods to form air gaps between metal interconnects2025
Ultra-shallow dopant and ohmic contact regions by solid state diffusion2025
Selective film formation using a self-assembled monolayer2025
Sacrificial capping layer for gate protection2025
Sacrificial capping layer for gate protection2025
EUV active films for EUV lithography2025
Bonding layer and process of making2025
Methods for retaining a processing liquid on a surface of a semiconductor substr2025
Epitaxial high-K etch stop layer for backside reveal integration2025
Replacement channel 2D material integration2025
Methods to provide uniform wet etching of material within high aspect ratio feat2025