Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pulsed-plasma deposition of thin film layers

Pulsed-plasma deposition of thin film layers

US Patent 12131903 · Granted Oct 29, 2024

Estimated economic value: $69,228,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

In-situ reflectometry for real-time process control2025
Semiconductor processing chambers and methods for deposition and etch2025
Methods, systems, and apparatus for monitoring radiation output of lamps2025
Systems and methods for controlling non-uniformity2025
Semiconductor processing chamber to accommodate parasitic plasma formation2025
Single chamber flowable film formation and treatments2024
High-density substrate processing systems and methods2024
Semiconductor processing chambers for deposition and etch2024
Semiconductor processing chambers for deposition and etch2023
High-density substrate processing systems and methods2023
In-situ metrology method for thickness measurement during PECVD processes2020
On-board metrology (OBM) design and implication in process tool2019