Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for parallel two-photon lithography using a metalens array

System and method for parallel two-photon lithography using a metalens array

US Patent 12130407 · Granted Oct 29, 2024

Estimated economic value: $79,829,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for using mechanical loading to create spatially patterned met2024
Birefringent waveplate and method for forming a waveplate having a birefringent 2023
Fast image acquisition system and method using pulsed light illumination and sam2023
System and method for ablation assisted nanostructure formation for graded index2022
System and method for plasmonic control of short pulses in optical fibers2022
System and method for repeated metal deposition-dewetting steps to form a nano-p2022
System and method for focal-plane illuminator/detector (FASID) design for improv2021
System and method for plasmonic control of short pulses in optical fibers2020
Nanostructured layer for graded index freeform optics2020
System and method for focal-plane angular-spatial illuminator/detector (fasid) d2019