Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polishing head, chemical-mechanical polishing system and method for polishing substrate

Polishing head, chemical-mechanical polishing system and method for polishing substrate

US Patent 12128522 · Granted Oct 29, 2024

Estimated economic value: $21,319,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Energy storage device2025
Flexible merge scheme for source/drain epitaxy regions2025
Method for forming a 3-D semiconductor memory structure comprising horizontal an2025
Three-dimensional stackable ferroelectric random access memory devices and metho2025
Memory device, semiconductor device and manufacturing method of the memory devic2025
Three-dimensional memory device with word lines extending through sub-arrays, se2025
Semiconductor device having a uniform and thin silicide layer on an epitaxial so2025
Epitaxial structures for fin-like field effect transistors2025
Three-dimensional memory device and manufacturing method thereof2025
Memory device comprising second memory cell having first terminal coupled to fir2025
3D semiconductor package including memory array2025
CMP safe alignment mark2025