Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reticle-masking structure, extreme ultra violet apparatus, and method of forming the same

Reticle-masking structure, extreme ultra violet apparatus, and method of forming the same

US Patent 12066760 · Granted Aug 20, 2024

Estimated economic value: $10,659,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Post-routing congestion optimization2025
Hard-to-fix (HTF) design rule check (DRC) violations prediction2025
EUV photomask and manufacturing method of the same2025
EUV photomask and manufacturing method of the same2025
Method for polishing semiconductor substrate2024
Short channel effect based random bit generator2024
Hard-to-fix (HTF) design rule check (DRC) violations prediction2024
Post-routing congestion optimization2023
EUV photomask and manufacturing method of the same2023
EUV photomask and manufacturing method of the same2023
Device and methods for chemical mechanical polishing2023
Short channel effect based random bit generator2023