Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating a semiconductor device using wet etching and dry etching and semiconductor device

Method for fabricating a semiconductor device using wet etching and dry etching and semiconductor device

US Patent 12018387 · Granted Jun 25, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Power semiconductor device having an electrode with an embedded material2025
Semiconductor device having a transistor with trenches and mesas2025
Power diode and method of manufacturing a power diode2025
Method of producing a semiconductor device having a ferroelectric gate stack2024
Semiconductor device including a plurality of trenches2024
Power semiconductor device having a barrier region2024
Power semiconductor device with p-contact and doped insulation blocks defining c2024
Power semiconductor device having elevated source regions and recessed body regi2024
Diode including a plurality of trenches2024
Semiconductor component with edge termination region2023
Semiconductor device and method for forming a semiconductor device2023
Power semiconductor device having overvoltage protection and method of manufactu2023