Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask

Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask

US Patent 12001132 · Granted Jun 4, 2024

Estimated economic value: $16,780,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

EUV pellicle and mounting method thereof on photo mask2025
Reticle container2025
Reticle container2025
Reticle container2025
Pellicle membrane with improved properties2025
Pellicle membrane with improved properties2025
Optical assembly with coating and methods of use2025
Optical assembly with coating and methods of use2025
Optical assembly with coating and methods of use2025
EUV photo masks and manufacturing method thereof2025
EUV photo masks and manufacturing method thereof2025
EUV photo masks and manufacturing method thereof2025