Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › EUV light source and apparatus for lithography

EUV light source and apparatus for lithography

US Patent 11979971 · Granted May 7, 2024

Estimated economic value: $17,992,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

EUV radiation source apparatus for lithography2025
Particle image velocimetry of extreme ultraviolet lithography systems2025
Onsite cleaning system and method2025
Semiconductor processing tool and methods of operation2025
Lithography system and methods2025
Methods of servicing photolithographic apparatus2025
Method and apparatus for removing contamination2025
Extreme ultraviolet lithography system2025
Extreme ultraviolet lithography system2025
Inspection system for extreme ultraviolet (EUV) light source2025
System and method for detecting debris in a photolithography system2025
Methods of cleaning a lithography system2025