Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods of vapor deposition of ruthenium using an oxygen-free co-reactant

Methods of vapor deposition of ruthenium using an oxygen-free co-reactant

US Patent 11976352 · Granted May 7, 2024

Estimated economic value: $308,626,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of forming low-resistivity Ru ALD through a bi-layer process and related 2025
Methods of forming molybdenum-containing films deposited on elemental metal film2025
Compounds and methods for selectively forming metal-containing films2025
Compounds and methods for selectively forming metal-containing films2025
Methods of forming low resistivity titanium nitride thin film in horizontal vias2024
Radiofrequency skin device2024
Process for the production of a molecular layer and electronic component compris2024
Filter element mounting structure2024
Method for producing an electronic component which includes a self-assembled mon2024
Filter element butt joint mechanism2024
Concentrated water regulating valve2024
Valve body2024