Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for removing impurities in thin film and substrate processing apparatus

Method for removing impurities in thin film and substrate processing apparatus

US Patent 11972946 · Granted Apr 30, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Smooth titanium nitride layers and methods of forming the same2025
Time-division multiplexing-based multi-channel electrocardiogram measurement app2025
Semiconductor device with capacitors having different dielectric layer heights2024
Method and apparatus for user recognition using 2D EMG spectrogram image2024
Batch-type substrate processing apparatus and operation method thereof2023
Smooth titanium nitride layers and methods of forming the same2023
Substrate processing apparatus2022
Bias circuit and amplifying device with temperature compensation2022
Substrate processing system2022
Batch type plasma substrate processing apparatus2021
Amplifying device with adaptive CTAT biasing control2021
Method of normalizing tachycardia ECG based on P-wave and T-wave data interpolat2021