Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gate structures in transistor devices and methods of forming same

Gate structures in transistor devices and methods of forming same

US Patent 11967504 · Granted Apr 23, 2024

Estimated economic value: $23,566,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor devices including backside power via and methods of forming the sa2025
Semiconductor device and method of forming the same2025
Transistor gate structures and methods of forming the same2025
Method of manufacturing semiconductor devices and semiconductor devices2025
Semiconductor device and method of fabricating the same2025
Nanostructure field-effect transistor device and method of forming2025
Hardmask formation with hybrid materials in semiconductor device2025
Methods of forming semiconductor devices2025
Dummy Fin structures and methods of forming same2025
Gate structures in transistors and method of forming same2025
Techniques for semiconductor gate and contact formation to reduce seam formation2025
Gate structures for multi-gate devices2025