Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus

Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus

US Patent 11948778 · Granted Apr 2, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate processing apparatus, and method of manufacturing semiconductor device2025
Substrate processing apparatus, and method of manufacturing semiconductor device2025
Substrate processing apparatus, and method of manufacturing semiconductor device2025
Substrate processing apparatus, method of manufacturing semiconductor device, an2024
Substrate processing apparatus2024
Method of manufacturing semiconductor device, cleaning method, and non-transitor2024
Method of manufacturing semiconductor device2023
Substrate processing apparatus, method of manufacturing semiconductor device and2022
Substrate processing apparatus and temperature measurement unit2022
Method of manufacturing semiconductor device and recording medium2021
Substrate processing apparatus, method of manufacturing semiconductor device, an2021
Substrate processing apparatus, method of manufacturing semiconductor device, an2021