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Home › MEMS device having a metallization structure embedded in a dielectric structure with laterally offset sidewalls of a first portion and a second portion

MEMS device having a metallization structure embedded in a dielectric structure with laterally offset sidewalls of a first portion and a second portion

US Patent 11932534 · Granted Mar 19, 2024

Estimated economic value: $13,397,000 ⓘ

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