Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dummy poly layout for high density devices

Dummy poly layout for high density devices

US Patent 11881477 · Granted Jan 23, 2024

Estimated economic value: $73,198,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Revising IC layout design to eliminate gaps between isolation structures2025
Revising IC layout design to eliminate gaps between isolation structures2025
Integrated circuit structure with gate structures on grids and method for formin2025
Integrated circuit structure with gate structures on grids and method for formin2025
Gate isolation features in semiconductor devices and methods of fabricating the 2025
Gate isolation features in semiconductor devices and methods of fabricating the 2025
Methods for forming pattern layout, mask, and semiconductor structure2025
Methods for forming pattern layout, mask, and semiconductor structure2025
Polysilicon design for replacement gate technology2025
Integrated circuit having angled conductive feature2025
Semiconductor devices2025
Semiconductor devices2025