Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for measuring a substrate for semiconductor lithography

Method for measuring a substrate for semiconductor lithography

US Patent 11880145 · Granted Jan 23, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device for measuring a substrate and method for correcting cyclic error componen2024
Device and method for characterizing a microlithographic mask2021
Detection device for detecting a structure on an area portion of a lithography m2021
Method for capturing and compensating ambient effects in a measuring microscope2020
Method and apparatus for determining the position and orientation of a missile2011
Method and device for automatically determining the position of transceivers of 2010
Motor-pump unit2007
Device method for switching of currents in a stator winding of a generator-elect2007