Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for manufacturing semiconductor device having gallium oxide-based semiconductor layer

Method for manufacturing semiconductor device having gallium oxide-based semiconductor layer

US Patent 11862477 · Granted Jan 2, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Surface treatment method for gallium oxide-based semiconductor substrate and sem2025
Surface treatment method for gallium oxide-based semiconductor substrate and sem2025
Near-infrared light emitting semiconductor element and method for manufacturing 2025
Method for manufacturing semiconductor device2025
Shoe sole2025
Method for manufacturing semiconductor device2024
P-type gallium oxide semiconductor device with alternating layers2024
Nitride semiconductor device and substrate thereof, method for forming rare eart2024
Display device and method of manufacturing same2024
Manufacturing method of semiconductor device2024
Manufacturing method of semiconductor device2024
Semiconductor device and method for manufacturing the same2023