Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Organometallic tin compounds as EUV photoresist

Organometallic tin compounds as EUV photoresist

US Patent 11827659 · Granted Nov 28, 2023

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for gaze estimation based on physically interpretable features2025
Organometallic tin compounds as EUV photoresist2025
Gaze point estimation method, device, and electronic device2024
Gaze estimation cross-scene adaptation method and device based on outlier guidan2024
Image defogging method based on simulated polarization foggy scene data set2024
Edge-guided human eye image analyzing method2024
Method for determining the direction of gaze based on adversarial optimization2024
Unsupervised image-to-image translation method based on style-content separation2024
Method for calculating image highlight reflection separation based on polarizati2024
Stripping H2S off natural gas for multiple isotope analyses2023
Calculation method of three-dimensional model's spherical expression based on mu2023
Determining source rock maturity based on hydrogen isotopes2023