Embedded high-Z marker material and process for alignment of multilevel ebeam lithography

Assignee

• Hrl Laboratories

Inventors

• Christopher David Bohn (3 patents)
• Maxwell Choi (3 patents)
• Melanie S. Yajima (12 patents)
• Sieu Ha (2 patents)
• Maggy Lau (6 patents)
• Clayton Jackson (3 patents)
• Wonill Ha (23 patents)
• Matthew Borselli (3 patents)

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