Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Ruthenium CMP chemistry based on halogenation

Ruthenium CMP chemistry based on halogenation

US Patent 11820919 · Granted Nov 21, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method to selectively etch silicon nitride to silicon oxide using surface alkyla2025
Methods for wet atomic layer etching of molybdenum2025
Methods for forming vertically layered ionic liquid crystal (ILC) structures on 2025
Methods for etching a substrate using a hybrid wet atomic layer etching process2025
Methods for wet etching of noble metals2025
Systems for etching a substrate using a hybrid wet atomic layer etching process2025
Methods for selective removal of surface oxides on metal films2025
Ruthenium CMP chemistry based on halogenation2024
Dynamically adjusted purge timing in wet atomic layer etching2024
Methods for wet atomic layer etching of copper2024
Methods for wet atomic layer etching of ruthenium2023
Processing system and platform for wet atomic layer etching using self-limiting 2022