Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for measuring damage of a substrate caused by an electron beam

Method for measuring damage of a substrate caused by an electron beam

US Patent 11774381 · Granted Oct 3, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Arrangement for and method of determining cantilever deflection in a scanning pr2025
Alignment system and method for aligning an object having an alignment mark2025
Method of and system for performing subsurface imaging using vibration sensing2024
Lithographic patterning method2024
Heterodyne scanning probe microscopy method and system2024
Method of positioning a carrier on a flat surface, and assembly of a carrier and2023
Atomic force microscopy cantilever, system and method2023
Heterodyne scanning probe microscopy method and scanning probe microscopy system2023
Scanning probe microscope, scan head and method2023
Frequency tracking for subsurface atomic force microscopy2022
Subsurface atomic force microscopy with guided ultrasound waves2022
Scanning probe microscopy system for and method of mapping nanostructures on the2022