Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hard mask deposition using direct current superimposed radio frequency plasma

Hard mask deposition using direct current superimposed radio frequency plasma

US Patent 11773484 · Granted Oct 3, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus for edge control during plasma processing2025
Non-intrusive method for 2D/3D mapping plasma parameters2025
Plasma processing apparatus with tunable electrical characteristic2025
Plasma processing with magnetic ring X point2025
Pulsed capacitively coupled plasma processes2025
Balanced RF resonant antenna system2025
Plasma processing methods using low frequency bias pulses2025
Plasma processing with broadband RF waveforms2025
Plasma processing with broadband RF waveforms2025
ALD process with plasma treatment2025
ALD process with plasma treatment2025
ALD process with plasma treatment2025