Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Onium salt, chemically amplified negative resist composition, and pattern forming process

Onium salt, chemically amplified negative resist composition, and pattern forming process

US Patent 11773059 · Granted Oct 3, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemically amplified resist composition, photomask blank, method for forming res2025
Positive resist composition and pattern forming process2025
Diverting agent and method of filling fracture in well using same2025
Crystal of 3-(difluoromethyl)-1-methyl-n-(1,1,3-trimethyl-2,3-dihydro-1H-inden-42025
Vehicle window structure2025
Evacuation running assistance system2025
Onium salt, chemically amplified resist composition and patterning process2025
Positive resist composition and pattern forming process2025
Negative resist composition and pattern forming process2025
Information processing apparatus, non-transitory computer readable medium storin2025
Onium salt, chemically amplified resist composition and patterning process2025
Electronic component and method of manufacturing electronic component2025