Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical polishing apparatus using a magnetically coupled pad conditioning disk

Chemical mechanical polishing apparatus using a magnetically coupled pad conditioning disk

US Patent 11766758 · Granted Sep 26, 2023

Estimated economic value: $9,885,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Antenna structure and mobile device2025
Antenna switching circuitry set and electronic device2025
Semiconductor wafer storage device2025
Chemical mechanical polishing apparatus using a magnetically coupled pad conditi2024
Chemical mechanical polishing apparatus using a magnetically coupled pad conditi2024
Chemical mechanical polishing apparatus using a magnetically coupled pad conditi2024
Chemical mechanical polishing apparatus2024
Semiconductor wafer storage device2023
Sensing module and electronic device2022
Method and apparatus for monitoring chemical mechanical polishing process2022
Semiconductor wafer storage device2021
Apparatus and methods for chemical mechanical polishing2021