Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming a hard mask with a tapered profile

Method for forming a hard mask with a tapered profile

US Patent 11765980 · Granted Sep 19, 2023

Estimated economic value: $7,328,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Metal-clad laminate2025
High aspect ratio bosch deep etch2025
Semiconductor device and method for fabricating the same2025
Bottom electrode via and conductive barrier design to eliminate electrical short2025
Bottom electrode via and conductive barrier design to eliminate electrical short2025
Split gate memory device and method of fabricating the same2025
Split gate memory device and method of fabricating the same2025
Memory devices and method of fabricating same2025
Memory devices and method of fabricating same2025
Memory device having via landing protection2025
Semiconductor memory device and method for fabricating the same2025
Semiconductor memory device and method for fabricating the same2025