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Home › Method for processing a substrate by oscillating a boundary layer of the flow of one or more process gases over a surface of a substrate and systems for processing a substrate using the method

Method for processing a substrate by oscillating a boundary layer of the flow of one or more process gases over a surface of a substrate and systems for processing a substrate using the method

US Patent 11761080 · Granted Sep 19, 2023

Estimated economic value: $44,467,000 ⓘ

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