Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for increasing germanium concentration of surfaces of a silicon germanium portion of a fin and resulting semiconductor devices

Methods for increasing germanium concentration of surfaces of a silicon germanium portion of a fin and resulting semiconductor devices

US Patent 11721745 · Granted Aug 8, 2023

Estimated economic value: $7,870,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Contact features of semiconductor devices2025
Lens assembly2025
System and method for obtaining instrumentation data2025
Integrated circuit layout including standard cells and method to form the same2025
Semiconductor device2025
Integrated circuit, method for forming a layout of integrated circuit using stan2025
Wireless vehicle control device2025
Semiconductor structure and manufacturing method thereof2025
System and method for selecting instrumentation technique2025
Static random access memory2025
Semiconductor device and manufacturing method thereof2025
Heat dissipating features for laser drilling process2025