Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Structure and formation method of semiconductor device structure with gate structure

Structure and formation method of semiconductor device structure with gate structure

US Patent 11682710 · Granted Jun 20, 2023

Estimated economic value: $9,516,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Detection of Bring Your Own Vulnerable Driver attacks in Windows-based systems2025
Reduction of damages to source/drain features2025
Barrier layer for contact structures of semiconductor devices2025
Semiconductor structure including isolation structure with dielectric stack and 2025
Circuit devices with gate seals2025
Method of forming semiconductor device structure with gate structure2025
Method of forming semiconductor device structure with gate structure2025
Semiconductor structure and method of forming the same2024
Formation method of semiconductor device structure with gate stacks2024
Semiconductor device and method for making the same2024
Circuit devices with gate seals2023
Barrier layer for contact structures of semiconductor devices2023