Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

US Patent 11681214 · Granted Jun 20, 2023

Estimated economic value: $225,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reflective mask blank, reflective mask, and method for manufacturing semiconduct2025
Reflective mask blank and reflective mask2024
Reflective mask blank, reflective mask and manufacturing method thereof, and sem2024
Reflective mask blank, reflective mask, method of manufacturing reflective mask,2024
Reflective mask blank, reflective mask, and method for manufacturing reflective 2024
Reflective structure, reflective mask blank, reflective mask and method of manuf2024
Reflective structure, reflective mask blank, reflective mask and method of manuf2024
Reflective mask blank, reflective mask, and method for manufacturing reflective 2024
Reflective film coated substrate, mask blank, reflective mask, and semiconductor2024
Reflective mask blank, reflective mask and method of manufacturing semiconductor2024
Method for manufacturing reflective mask blank, reflective mask blank, method fo2023
Reflective mask blank, reflective mask and manufacturing method thereof, and sem2023