Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photomask, exposure apparatus, and method of fabricating three-dimensional semiconductor memory device using the same

Photomask, exposure apparatus, and method of fabricating three-dimensional semiconductor memory device using the same

US Patent 11662659 · Granted May 30, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Modular type multi-plex PCR apparatus2025
Blank formed of fabric for manufacturing no-show socks, no-show socks formed of 2025
Activating new device based on container in vehicle2025
Ferroelectric fluorescent self-assembly compound and organic electronic element 2025
Electronic device with metal frame antenna2025
Three-dimensional semiconductor memory devices, methods of fabricating the same,2025
Color solar cell module2025
Resin composition and manufacturing method of coating layer using the same2025
Methods for manufacturing semiconductor devices using MOIRÉ patterns2025
Method for setting model threshold of facility monitoring system2025
Electronic device including an antenna2025
Display device2024