Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › FinFET transistor cut etching process method

FinFET transistor cut etching process method

US Patent 11637194 · Granted Apr 25, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for cutting off FIN field effect transistor2023
Method for cutting off FIN field effect transistor2023
Method for cutting off FIN field effect transistor2023
Method for cutting off FIN field effect transistor2023
Method for manufacturing semiconductor device2023
Method for manufacturing semiconductor device2023
Method for manufacturing a 14nm-node BEOL 32nm-width metal2022
FinFET and a manufacturing method of a contact thereof2022
Method for making self-aligned double pattern2022
Method for making self-aligned double pattern2022
Method for making self-aligned double pattern2022
Method for making self-aligned double pattern2022