Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system

Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system

US Patent 11585764 · Granted Feb 21, 2023

Estimated economic value: $24,540,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical-dose substrate deposition monitoring2025
Chemical-dose substrate deposition monitoring2025
Adaptive control of variability in device performance in advanced semiconductor 2025
Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manuf2025
Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manuf2025
Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manuf2025
Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manuf2025
Process recipe creation and matching using feature models2024
Time-series fault detection, fault classification, and transition analysis using2024
Prescriptive analytics in highly collinear response space2024
Endpoint detection in low open area and/or high aspect ratio etch applications2024
Semiconductor processing tools with improved performance by use of hybrid learni2024