Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dual XY variable aperture in an ion implantation system

Dual XY variable aperture in an ion implantation system

US Patent 11574796 · Granted Feb 7, 2023

Estimated economic value: $44,390,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Flying capacitor primary side circuit for isolated DC/DC converter2025
Etch rate modulation of FinFET through high-temperature ion implantation2025
Methods, mediums, and systems for identifying tunable domains for ion beam shape2025
Particle accelerator having novel electrode configuration for quadrupole focusin2025
Model-based controlled load lock pumping scheme2025
Linear accelerator assembly including flexible high-voltage connection2025
Processing chamber with annealing mini-environment2025
Single-slot tubular cathode2024
Resonator, linear accelerator configuration and ion implantation system having r2024
Cyclotron having continuously variable energy output2024
Drift tube electrode arrangement having direct current optics2024
Spinning disk with electrostatic clamped platens for ion implantation2024