Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate support, lithographic apparatus and loading method

Substrate support, lithographic apparatus and loading method

US Patent 11556063 · Granted Jan 17, 2023

Estimated economic value: $56,072,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Membrane for EUV lithography2025
Contaminant analyzing metrology system, lithographic apparatus, and methods ther2025
Method of manufacturing a substrate support for a lithographic apparatus, substr2025
Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for 2025
Pellicle and pellicle assembly2024
Pellicle and pellicle assembly2024
Pellicle and pellicle assembly2024
Substrate support, lithographic apparatus and loading method2024
Substrate support, lithographic apparatus and loading method2024
Substrate support, lithographic apparatus and loading method2024
Substrate support, lithographic apparatus and loading method2024
Systems and methods for adjusting prediction models between facility locations2024