Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound

US Patent 11550221 · Granted Jan 10, 2023

Assignee

Inventors

View full patent text on Google Patents →