Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating a semiconductor device including a gate structure with an inclined side wall

Method for fabricating a semiconductor device including a gate structure with an inclined side wall

US Patent 11538807 · Granted Dec 27, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of manufacturing a semiconductor device having a node capping pattern and2025
Semiconductor device2025
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2024
Semiconductor device2024
Semiconductor device2024
Semiconductor device and method for fabricating the same2023