Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing highly dispersed silicon dioxide

Method for producing highly dispersed silicon dioxide

US Patent 11498841 · Granted Nov 15, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus for deposition of polycrystalline silicon comprising uniformly spaced 2017
Polycrystalline silicon rod and method for producing polysilicon2016
Rod-type polysilicon having improved breaking properties2016
Rod-type polysilicon having improved breaking properties2016
Graphite electrode2013
Polycrystalline silicon rod for zone reflecting and a process for the production2011