Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for selective deposition using a sacrificial capping layer

Methods for selective deposition using a sacrificial capping layer

US Patent 11495459 · Granted Nov 8, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and systems for forming a layer comprising vanadium and nitrogen2025
Method of forming a vanadium nitride-containing layer2025
Methods and systems for forming a layer comprising vanadium and oxygen2025
Structures with boron- and gallium-doped silicon germanium layers and methods an2025
Method for depositing boron and gallium containing silicon germanium layers2025
Method for depositing boron and gallium containing silicon germanium layers2025
Method for depositing boron and gallium containing silicon germanium layers2025
Methods and systems for filling a gap2025
Traffic accident forensics method based on blockchain2025
Deposition of oxides and nitrides2025
Methods and systems for forming a layer comprising aluminum, titanium, and carbo2025
Method and wafer processing furnace for forming an epitaxial stack on a pluralit2025