Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering target, oxide semiconductor thin film, and method for producing oxide semiconductor thin film

Sputtering target, oxide semiconductor thin film, and method for producing oxide semiconductor thin film

US Patent 11462399 · Granted Oct 4, 2022

Estimated economic value: $98,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device2025
Sputtering target, oxide semiconductor thin film, and method for producing these2022
Sputtering target, oxide semiconductor thin film, and method for producing these2022
Crystalline oxide semiconductor thin film, method for producing crystalline oxid2020
Sputtering target2019
Sputtering target2017
Sintered material, and process for producing same2016
In2O3—SnO2—ZnO sputtering target2015
In—Ga—Zn oxide sputtering target and method for producing same2015
Thin-film transistor2015
Sintered oxide body, target comprising the same, and oxide semiconductor thin fi2015
Sputtering target comprising an oxide sintered body comprising In, Ga, and Zn2015