Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning solution for removing dry etching residue and method for manufacturing semiconductor substrate using same

Cleaning solution for removing dry etching residue and method for manufacturing semiconductor substrate using same

US Patent 11441109 · Granted Sep 13, 2022

Estimated economic value: $116,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Composition and method for producing cellulose fiber2024
Aqueous composition and cleaning method using same2023
Aqueous composition and cleaning method using same2023
Composition having suppressed alumina damage and production method for semicondu2022
Aqueous composition and cleaning method using same2022
Solder composition and electronic board2019
Liquid composition for cleaning semiconductor device, method for cleaning semico2019
Liquid composition for cleaning semiconductor device, method for cleaning semico2019
Silicon carbide (SiC) MOSFET with a silicon oxide layer capable of suppressing d2019
Treatment liquid for inhibiting pattern collapse in microstructure and method of2015
Insulating film material, method of film formation using insulating film materia2013
Outer mirror for side door of a vehicle2011