Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Utilize pattern recognition to improve SEM contour measurement accuracy and stability automatically

Utilize pattern recognition to improve SEM contour measurement accuracy and stability automatically

US Patent 11422473 · Granted Aug 23, 2022

Estimated economic value: $49,276,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Headset accessories for VR glasses2025
Active energy-absorbing shock absorber for perforation combined well testing2025
TopVia interconnect with enlarged via top2025
Floor-standing air conditioner indoor unit and air conditioner2025
Antenna assembly and electronic apparatus2025
Blockchain-based power data transmission control method and device and storage m2025
Work function metal patterning for nanosheet CFETs2025
Method for fabricating semiconductor structure and semiconductor structure2025
Data signaling for wireless communication networks2025
Gate-all-around nanosheet-FET with variable channel geometries for performance o2025
Organic compounds2025
Tactile pattern super resolution reconstruction method and acquisition system2025