Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for controlling plasma instability in semiconductor fabrication

Systems and methods for controlling plasma instability in semiconductor fabrication

US Patent 11393729 · Granted Jul 19, 2022

Estimated economic value: $257,481,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Detection and location of anomalous plasma events in fabrication chambers2025
Anomalous plasma event detection and mitigation in semiconductor processing2025
Mechanical suppression of parasitic plasma in substrate processing chamber2025
Mechanical suppression of parasitic plasma in substrate processing chamber2025
Combiner and distributor for adjusting impedances or power across multiple plasm2024
Mechanical suppression of parasitic plasma in substrate processing chamber2024
Mechanical suppression of parasitic plasma in substrate processing chamber2024
Control of wafer bow in multiple stations2023
Control of wafer bow in multiple stations2023
Suppression of parasitic deposition in a substrate processing system by suppress2023
Suppression of parasitic deposition in a substrate processing system by suppress2023
Mechanical suppression of parasitic plasma in substrate processing chamber2023