Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming oxide film, method of manufacturing semiconductor device, and apparatus configured to form oxide film

Method of forming oxide film, method of manufacturing semiconductor device, and apparatus configured to form oxide film

US Patent 11373864 · Granted Jun 28, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Energy storage system2025
Method for manufacturing semiconductor device2025
Silicon carbide semiconductor device with cell section and outer periphery secti2023
Wafer processing apparatus and method for processing wafer2023
Wafer processing apparatus and method for processing wafer2023
Wafer processing apparatus and method for processing wafer2023
Mist generator, film formation apparatus, and method of forming film using the f2022
Mist generator, film formation apparatus, and method of forming film using the f2022
Mist generator, film formation apparatus, and method of forming film using the f2022
Method of forming gallium oxide film2022
Method of forming gallium oxide film2022
Method of forming gallium oxide film2022