Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing apparatus, processing system, and method of etching porous film

Plasma processing apparatus, processing system, and method of etching porous film

US Patent 11361945 · Granted Jun 14, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Etching method and etching apparatus2025
Selective etching with fluorine, oxygen and noble gas containing plasmas2024
Method for etching oxide semiconductor film and plasma processing apparatus2024
Etching method2023
Etching method2022
Plasma etching method2021
Plasma etching apparatus and method2020
Method for etching copper layer2020
Etching method2020
Method of processing target object to be processed2020
Method and system for performing post-etch annealing of a workpiece2019
Method of etching porous film2019