Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods, apparatuses and systems for substrate processing for lowering contact resistance

Methods, apparatuses and systems for substrate processing for lowering contact resistance

US Patent 11328929 · Granted May 10, 2022

Estimated economic value: $45,778,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Image forming apparatus having odor sensor for detecting odor diffusing from odo2025
Photosensitive drum unit2025
Drum cartridge and developing cartridge capable of suppressing variation in posi2025
Semiconductor memory device2025
Isotropic silicon nitride removal2025
Developer cartridge provided with gear having engagement portions2025
Multilayer circuit board and electronic-component mount multilayer board2025
Micro-LED board and display device2025
On-board cleaning of tooling parts in hybrid bonding tool2025
Developing cartridge providing layout of electrodes and detection gear2025
Electronic key terminal2024
Shutter disk2024